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Two founders from Harvard approached us many years ago about manufacturing prototype tools to demonstrate proof-of-concept of a revolutionary ALD process for the semiconductor industry. They were in search of a business partner who had the capability to take their proof-of-concept laboratory tool and turn it into a reproducible and reliable electromechanical manufactured product.
Once a business plan was agreed on, our engineers set to work driving a DFM project using only design concepts and process parameters as the guide for this complex electromechanical system design. Critical to the design was control of various parameters such as gas flow, heating, cooling, and vacuum. The final design called for numerous custom components. Many were fabricated and assembled in-house such as precision machined and welded vacuum chambers, plate heaters, and process gas lines. We relied on our well-established supply chain for others such as frame weldments, electronics boxes, and outer enclosure panels.As the design progressed and the BOM grew, there were many commercial components and specialty parts that needed to be sourced, some from or existing supply chain but many others from new suppliers. This included power distribution, controls, heaters, vacuum, and gas distribution components. Our engineers were able to design a tool from the ground up that continues to be a staple product line in our portfolio of high mix / low to medium volume electromechanical manufactured products. Through a continued DFM program, the product has evolved into several different models and enhanced with technology advancements and increased reliability. This customer, in particular, relies heavily on us to handle everything from manufacturing engineering problem solving, cost reduction, supplier quality, and product validation to ship directly to global customers.
The ALD tools we manufacture offer precise control down to the atomic scale. This is accomplished through sequential pulsing of special precursor vapors, each of which forms about one atomic layer during each pulse, (reaction cycle). Reaction cycles are then repeated until the desired film thickness is achieved. One atomic layer deposition systems are designed to deposit pinhole-free coatings that are perfectly uniform in thickness, even deep inside pores, trenches, and cavities. These tools require finite control of gas flow, temperature, vacuum, and other critical parameters.
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